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 Modeling of NBTI-Induced PMOS Degradation under Arbitrary Dynamic Temperature Variation
Bin Zhang, Michael Orshansky

Citation
Bin Zhang, Michael Orshansky. "Modeling of NBTI-Induced PMOS Degradation under Arbitrary Dynamic Temperature Variation". International Symposium on Quality Electronic Design (ISQED), 774-779, March, 2008.

Abstract
Negative bias temperature instability (NBTI) is one of the primary limiters of reliability lifetime in nano-scale integrated circuits. NBTI manifests itself in a gradual increase in the magnitude of PMOS threshold voltage, resulting in the degradation of circuit performance over time. NBTI is highly sensitive to operating temperature, making the amount of degradation strongly dependent on the thermal history of the chip. In order to accurately predict the amount of threshold voltage increase, the precise temperature profile must be utilized. The existing models are based on the simplified analysis which assumes that the temperature takes up to two possible fixed values over time. These models are inaccurate when predicting the impact of continuously-changing temperature that spans a large range. Our experiments show that proposed model accounting for temperature variation provides a significantly tighter bound for the simulation than that from the model that ignores the temperature variation and assumes a constant (worst-case) temperature. In our experiment, the amount of degradation predicted by the proposed dynamic temperature model is on average 46% less conservative compared to the model based on the worst-case temperature.

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Citation formats  

  • HTML
    Bin Zhang, Michael Orshansky. <a
    href="http://www.gigascale.org/pubs/1300.html">Modeling
    of NBTI-Induced PMOS Degradation under Arbitrary Dynamic
    Temperature Variation</a>, International Symposium on
    Quality Electronic Design (ISQED), 774-779, March, 2008.
  • Plain text
    Bin Zhang, Michael Orshansky. "Modeling of NBTI-Induced PMOS
    Degradation under Arbitrary Dynamic Temperature Variation".
    International Symposium on Quality Electronic Design
    (ISQED), 774-779, March, 2008.
  • BibTeX
    @inproceedings{ZhangOrshansky08_ModelingOfNBTIInducedPMOSDegradationUnderArbitrary,
        author = {Bin Zhang and Michael Orshansky},
        title = {Modeling of NBTI-Induced PMOS Degradation under
                  Arbitrary Dynamic Temperature Variation},
        booktitle = {International Symposium on Quality Electronic
                  Design (ISQED)},
        pages = {774-779},
        month = {March},
        year = {2008},
        abstract = {Negative bias temperature instability (NBTI) is
                  one of the primary limiters of reliability
                  lifetime in nano-scale integrated circuits. NBTI
                  manifests itself in a gradual increase in the
                  magnitude of PMOS threshold voltage, resulting in
                  the degradation of circuit performance over time.
                  NBTI is highly sensitive to operating temperature,
                  making the amount of degradation strongly
                  dependent on the thermal history of the chip. In
                  order to accurately predict the amount of
                  threshold voltage increase, the precise
                  temperature profile must be utilized. The existing
                  models are based on the simplified analysis which
                  assumes that the temperature takes up to two
                  possible fixed values over time. These models are
                  inaccurate when predicting the impact of
                  continuously-changing temperature that spans a
                  large range. Our experiments show that proposed
                  model accounting for temperature variation
                  provides a significantly tighter bound for the
                  simulation than that from the model that ignores
                  the temperature variation and assumes a constant
                  (worst-case) temperature. In our experiment, the
                  amount of degradation predicted by the proposed
                  dynamic temperature model is on average 46% less
                  conservative compared to the model based on the
                  worst-case temperature. },
        URL = {http://www.gigascale.org/pubs/1300.html}
    }
    

Posted by Michael Orshansky on 6 Jun 2008..

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